Ebl Process Controller

---
name: ebl-process-controller
description: Electron Beam Lithography skill for high-resolution nanopatterning with dose optimization and proximity effect correction
allowed-tools:
  - Read
  - Write
  - Glob
  - Grep
  - Bash
metadata:
  specialization: nanotechnology
  domain: science
  category: fabrication
  priority: high
  phase: 6
  tools-libraries:
    - BEAMER
    - GenISys TRACER
    - Raith NanoSuite
graph:
  domains: [domain:nanotechnology]
  skillAreas: [skill-area:mathematical-reasoning, skill-area:physics-simulation, skill-area:data-analysis]
  workflows: [workflow:experiment-design]
  roles: [role:research-engineer]
---

# EBL Process Controller

## Purpose

The EBL Process Controller skill provides comprehensive electron beam lithography process control, enabling high-resolution nanopatterning through dose optimization, proximity effect correction, and critical dimension control.

## Capabilities

- Pattern design and fracturing
- Dose optimization and modulation
- Proximity effect correction (PEC)
- Alignment and overlay control
- Resist processing optimization
- Critical dimension (CD) control

## Usage Guidelines

### EBL Process Control

1. **Pattern Preparation**
   - Design in CAD software
   - Fracture into write fields
   - Apply beam step size

2. **Dose Optimization**
   - Run dose matrices
   - Apply PEC algorithms
   - Account for pattern density

3. **Process Integration**
   - Optimize resist thickness
   - Control development conditions
   - Verify feature dimensions

## Process Integration

- Nanolithography Process Development
- Nanodevice Integration Process Flow

## Input Schema

```json
{
  "pattern_file": "string",
  "resist": "string",
  "thickness": "number (nm)",
  "target_cd": "number (nm)",
  "beam_voltage": "number (kV)",
  "beam_current": "number (pA)"
}
```

## Output Schema

```json
{
  "optimized_dose": "number (uC/cm2)",
  "pec_parameters": {
    "alpha": "number",
    "beta": "number",
    "eta": "number"
  },
  "write_time": "number (hours)",
  "expected_cd": "number (nm)",
  "cd_uniformity": "number (3sigma)"
}
```